|Krysak, M.; Kolb, T.; Neuber, C.; Schmidt, H.-W.; Ober, C.K.: All-dry processible and PAG-attached molecular glasses for improved lithographic performance, Proceedings of SPIE, 7639, 76392C-8 (2010) -- DOI: 10.1117/12.848385|
|Key words: A6|
As the semiconductor industry moves forward, resoln. limits are being pushed to the sub-30 nm regime. In order to meet these demands, radical new resist design and processes must be explored. We have developed a mol. glass system for all-dry processing conditions. Phys. vapor deposition (PVD) has been used for film formation onto silicon wafers. PVD deposits a uniform film of controlled thickness free from impurities that are often introduced by casting solvents used in traditional spin coating methods. Thermal development is used as an alternative to processing in solvents in order to prevent resist swelling and pattern collapse by capillary forces. The deposited mol. is designed to crosslink upon E-beam irradn. without additives, and therefore form a homogeneous, single component film. PAG-attached mol. glasses have been synthesized in order to promote film homogeneity as well. By tethering PAG directly to the mol. glass core, issues such as PAG aggregation can be remedied. Acid migration, which increases blur and LER, can also be hindered.