| SRC: Photoresist Design for Improved Line Edge Roughness |
| From 01/2008 to 01/2011 |
| Project leader: Hans-Werner Schmidt, Axel H. E. Müller, Matthias Ballauff, Christopher K. Ober |
| Coworkers: Florian Wieberger |
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Prof. Dr. Axel Müller
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