|142. Böker, A.; Müller, A.H.E.; Krausch, G.: Functional ABC triblock copolymers for controlled surface patterns on nanometer scale, Polym. Mater. Sci. Eng. 84, 312 (2001)|
We synthesized analogous series of monodisperse ABC triblock copolymers with sym. end blocks A/C and different short middle blocks B (5-10 wt.-%) with varying polarities by sequential anionic polymn.; i.e. polystyrene-b-poly(2-vinylpyridine)-b-poly(Me methacrylate) (PS-b-P2VP-b-PMMA) and polystyrene-b-poly(2-hydroxyethyl methacrylate)-b-poly(Me methacrylate) (PS-b-PHEMA-b-PMMA). Thin (thickness t .apprx. 20 nm) and ultrathin films (t < 7 nm) were prepd. by either dip-coating or adsorption from soln. onto silicon wafers. In all cases, the polar middle block adsorbs preferentially to the polar substrate, which results in a polymer film surface that exclusively consists of PS and PMMA microdomains. The copolymer films were investigated by scanning force microscopy. The lateral spacing and the morphol. of the developed structures can be controlled by film thickness and A/C block length.