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| Krysak, M.; Kolb, T.; Neuber, C.; Schmidt, H.-W.; Ober, C.K.: All-dry processible and PAG-attached molecular glasses for improved lithographic performance, Proceedings of SPIE, 7639, 76392C-8 (2010), doi:10.1117/12.848385 -- Details |
| Forman, D.C.; Wieberger, F.; Gröschel, A.H.; Müller, A.H.E.; Schmidt, H.-W.; Ober, C.K.: Comparison of star and linear ArF resists, Proceedings of SPIE, 7639, 76390P (2010), doi:10.1117/12.848344 -- Details |
| Pfeiffer, F.; Felix, N.M.; Neuber, C.; Ober, C.K.; Schmidt, H.-W.: Towards environmentally friendly, dry deposited, water developable molecular glass photoresists, Physical Chemistry Chemical Physics, 10, 1257 - 1262 (2008), doi:10.1039/b715819j -- Details |
| Pfeiffer, F.; Felix, N.M.; Neuber, C.; Ober, C.K.; Schmidt, H.-W.: Physical Vapor Deposition of Molecular Glass Photoresists: A New Route to Chemically Amplified Patterning, Advanced Functional Materials, 17(14), 2336-2342 (2007), doi:10.1002/adfm.200600717 -- Details |
| Krishnan, S.; Paik, M.Y.; Ober, C.K.; Hexemer, A.; Sohn, K. E.; Kramer, E.J.; Häckel, M.; Kador, L.; Kropp, D.; Schmidt, H.-W.: Tailoring surface properties using functional side groups on block copolymers, Polymeric Materials: Science & Engineering, 51(232nd ACS Meeting, ACS Paper), 105 (2006) |
| You, F.; Paik, M.Y.; Häckel, M.; Kador, L.; Kropp, D.; Schmidt, H.-W.; Ober, C.K.: Control and Suppression of Surface Relief Gratings in Liquid-Crystalline Perfluoroalkyl-Azobenzene Polymers, Advanced Functional Materials, 16, 1577-1581 (2006), doi:10.1002/adfm.200500711 |
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