| Pfeiffer, F.; Felix, N.M.; Neuber, C.; Ober, C.K.; Schmidt, H.-W.: Towards environmentally friendly, dry deposited, water developable molecular glass photoresists, Physical Chemistry Chemical Physics, 10, 1257 - 1262 (2008) -- DOI: 10.1039/b715819j | |
| Stichworte: A6 | |
| Abstract: Photoresists based on molecular glasses are gaining more and more importance as resist material to replace polymer based photoresist. In addition environmental issues have to be considered in the long-term. Therefore the paper describes novel negative photoresists containing a ternary mixture of a glassy low molecular functional polyphenol where the film preparation is possible by solvent-free physical vapor deposition. After UV light exposure and a thermal annealing process to enable acid catalyzed crosslinking between the molecular glass and the crosslinker, the photoresist was developed using only water to give well-defined patterns. In order to experimentally study efficiently the multiple parameters such as composition, exposure dose, and development times combinatorial PVD techniques were utilized. |
