|Bauer, W.A.; Neuber, C.; Ober, C.K.; Schmidt, H.-W.: Combinatorial Optimization of a Molecular Glass Photo Resist System for Electron Beam Lithography, Advanced Materials, 23(45), 5404-5408 (2011) -- DOI: 10.1002/adma.201103107|
Electron beam lithography is a powerful technique for the productionof nanostructures but pattern quality depends on numerous interacting process variables. Orthogonal gradients of resist composition, baking temperatures, and development time as well as dose variations inside writing fields are used to prepare ternary combinatorial libraries for an efficient stepwise optimization of a molecular glass negative tone resist system.