|Wieberger, F.; Kolb, T.; Neuber, C.; Ober, C.K.; Schmidt, H.-W.: Nanopatterning with tailored molecules, Proceedings of SPIE - Advances in Patterning Materials and Processes XXXI, 9051, 90510G-1 bis G-11 (2014) -- DOI: 10.1117/12.2047109|
Star block copolymer synthesis was performed in a controlled fashion by an in-situ core first ATRP route. The obtained resist materials on the basis of industrial used monomers with tailored star block copolymer architecture were systematically characterized and patterned. In dissolution investigations an excellent dissolution contrast between exposed and unexposed state was identified for this new resist material type. Additionally, the materials show an excellent sensitivity, which surpass the reference linear copolymer by a factor of eight. By a combinatorial resist optimization realized high resolution features are presented. Finally, preliminary results utilizing a further improved resist material design are shown.