|el Otell, Z.; Ringk, A.; Kolb, T.; Neuber, C.; Hansel, L.; de Marneffe, J.-F.: Molecular glass resist performance for nano-pattern transfer, Proceedings of SPIE - Advanced Etch Technology for Nanopatterning IV, 9428, 94280J (2015), doi:10.1117/12.2085828|
The performance of novel molecular glass resists is demonstrated in this work for the purposes of performing nano-pattern transfer. In order to improve the etch durability, post apply bake (PAB) and mixing two resists platforms were investigated. These resists showed a promising etch durability for ecient pattern transfer with lms as thin as 5 nm. Etch rate, surface roughness, evolution of the refractive index of these materials are presented to establish a good baseline and select appropriate candidate materials for patterning beyond-CMOS.