|Lorenzoni, M.; Wagner, D.; Neuber, C.; Schmidt, H.W.; Perez-Murano, F.: Sub-30 nm patterning of molecular resists based on crosslinking through tip based oxidation, Applied Surface Science, 442, 106-113 (2018) -- DOI: 10.1016/j.apsusc.2018.02.096|
Oxidation Scanning Probe Lithography (o-SPL) is an established method employed for device patterning at the nanometer scale. It represents a feasible and inexpensive alternative to standard lithographic techniques such as electron beam lithography (EBL) and nanoimprint lithography (NIL). In this work we applied non-contact o-SPL to an engineered class of molecular resists in order to obtain crosslinking by electrochemical driven oxidation. By patterning and developing various resist formulas we were able to obtain a reliable negative tone resist behavior based on local oxidation. Under optimal conditions, directly written patterns can routinely reach sub-30 nm lateral resolution, while the final developed features result wider, approaching 50 nm width.