|Wieberger, F.; Neuber, C.; Ober, C.K.; Schmidt, H.-W.: Tailored Star Block Copolymer Architecture for High Performance Chemically Amplified Resists, Advanced Materials, 24(44), 5939-5944 (2012) -- DOI: 10.1002/adma.201201547|
Star block copolymers are demonstrated for their application as a high-performance resist material. This new resist material shows advanced progress in sensitivity and solubility contrast and is finally combinatorially optimized to achieve a 66 nm line/space pattern. The tailored molecular architecture of the star block copolymer is synthesized via core-first atom transfer radical polymerization (ATRP) and shows narrow polydispersity indices below 1.2.