| Kästner, M.; Nieradka, K.; Ivanov, T.; Lenk, S.; Krivoshapkina, Y.; Ahmad, A.; Angelov, T.; Guliyev, E.; Reum, A.; Budden, M.; Hrasok, T.; Hofer, M.; Neuber, C.; Rangelow, I.W.: Electric field scanning probe lithography on molecular glass resists using self-actuating, self-sensing cantilever, Proceedings of SPIE - Alternative Lithographic Technologies VI, 9049, 9049C-1 bis C-9 (2014) -- DOI: 10.1117/12.2046973 | |
| Abstract: Within last two years, we have shown the positive-tone, development-less patterning of calixarene molecular glass resists using highly confined electric field, current-controlled scanning probe lithography scheme. Herein, we give a more detailed view insight describing the applied Scanning Probe Lithography (SPL) technology platform applying selfactuating, self-sensing cantilever. The experimental results are supported by first preliminary simulation results estimating the local electric field strength, the electron trajectories, and the current density distribution at the sample surface. In addition, the diameter of Fowler-Nordheim electron beam, emitted from SPL-tip, was calculated as function of the bias voltage for different current set-points and tip radii. In experimental part we show the reproducible writing of meander line patterns as well as the patterning of individual features using specially developed pattern generator software tool. |
